Imec has a patterning solution for a 42nm-pitch M1 layer and a 32nm-pitch M2 layer in logic design compatible with the foundry N5 requirements. The approach includes two scenarios for EUVL insertion that, when combined with an array of scaling boosters, serve as a basis of the industry requirements for power, performance, area and cost. ...
Read full article: Imec solution for EUV patterning
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